UV-DOAS platform | Gas-phase Cl2 configuration

GESHINE UV-DOAS Process Chlorine Analyzer

UV-DOAS chlorine analyzer for continuous process monitoring in chlor-alkali and chemical plants

Principle
UV-DOAS (differential optical absorption)
Range
Configured per application (datasheet pending)
Accuracy
Configured per application (datasheet pending)
Output
4-20mA, Modbus, HART
Product Overview

Overview

Gas-phase Cl2 measurement belongs to GESHINE’s unnumbered UV-DOAS platform in the brochure. The page is retained as a UV-DOAS chlorine configuration, without assigning a fabricated numeric ZS model. It uses UV differential optical absorption spectroscopy for continuous gas-phase Cl₂ measurement in chlor-alkali production, water treatment, and chemical safety applications.

Key Highlights
  • UV-DOAS optical cell architecture
  • Humidity and temperature compensation in the optical model
  • Automatic reference spectrum compensation
  • Corrosion-resistant wetted parts (project-configured for chlorine and acid-gas duty)
  • Extractive sample conditioning selected for wet-stack or acid-gas duty
  • Gas-phase Cl2 configuration of the unnumbered UV-DOAS platform

Full Technical Specifications

Key Performance

Key Performance metrics for the GESHINE UV-DOAS Process Chlorine Analyzer
Metric Value Status
Measurement Principle UV-DOAS (differential optical absorption spectroscopy) confirmed
Range Configured per application (datasheet pending) datasheet pending
Accuracy Configured per application (datasheet pending) datasheet pending
Response Configured per application (datasheet pending) datasheet pending
Output 4-20mA, Modbus, HART confirmed

Specifications

Specifications for the GESHINE UV-DOAS Process Chlorine Analyzer
SpecificationValue
Measurement PrincipleUV-DOAS (differential optical absorption spectroscopy)
Target ComponentGas-phase Cl₂
RangeConfigured per application (datasheet pending)
AccuracyConfigured per application (datasheet pending)
ResponseConfigured per application (datasheet pending)
Wetted MaterialsConfigured per application (datasheet pending)
Output4-20mA, Modbus, HART

Deployment Environments

Common process environments where this model is evaluated.

Chlor-alkali cell room monitoring
Water treatment Cl₂ dosing control
Chemical warehouse leak detection
Pulp & paper bleaching process control

Certification Scope

No certificate list is published for this unnumbered UV-DOAS configuration. Applicable standards, enclosure, area, and safety case are project-configured and confirmed during engineering review.

Certification scope for the GESHINE UV-DOAS Process Chlorine Analyzer
Standard Scope Variant Status Document
Hazardous-area / functional safety No certificate scope is published for this unnumbered configuration; applicable approvals are project-configured and confirmed during engineering review Project variant datasheet pending On request
Approvals project-configured

Request Documentation

Request technical datasheets, user manuals, certificates, and application notes for this model.

Evidence Notes

application-note

Gas-phase UV-DOAS chlorine architecture

The application set covers chlor-alkali, chemical storage, pulp and paper, and gas-phase water-treatment dosing contexts. This gas analyzer path uses UV-DOAS, corrosion-resistant project-configured wetted parts, reference-spectrum compensation, and extractive sample conditioning where wet or acid-gas matrices are present.

Technical / Engineering Details

Technical & Engineering Details

Secondary engineering detail — expand each topic for the full measurement, envelope, sample-system, and maintenance information.

01 Measurement Principle and Limits

How the measurement is bounded

UV-DOAS measures gas-phase Cl2 absorption with differential spectral processing for continuous process monitoring.

Requires

  • Corrosion-resistant wetted parts (project-configured) for chlorine and acid-gas contact
  • Reference-spectrum compensation for changing UV background
  • Extractive sample conditioning selected for wet-stack or acid-gas duty

Interferents and Limits

  • SO2, HCl, and HF spectral overlap can require matrix-specific compensation
  • Aerosols or condensation in a wet-stack sample path can change the optical basis
  • Aqueous free or total chlorine residual measurement is a separate aqueous water-domain path, not this gas-phase analyzer
  • Wet-stack gas without heated or corrosion-resistant sample conditioning
  • High SO2, HCl, or HF background without UV-DOAS matrix review
02 Operating Envelope

Use these limits as selection inputs, then confirm sample condition, ambient exposure, and materials before quotation.

Corrosive Agents
  • Cl2
  • SO2/HCl/HF spectral-overlap matrix review
Wetted Materials
Project-configured (datasheet pending)
Outside This Envelope
  • Aqueous chlorine residual analysis
  • Wet-stack or condensing duty without suitable heated sample conditioning
  • Matrix with strong UV-absorbing acid gases without application review
03 Sample System Boundary

Sampling mode, conditioning components, and exclusions define where the analyzer responsibility ends and the sample system begins.

Sampling Mode
extractive
Boundary Components
  • UV-DOAS optical cell
  • reference spectrum compensation
  • corrosion-resistant wetted path (project-configured)
  • extractive sample conditioning
Boundary Exclusions
  • Aqueous sample panels are outside this gas-phase analyzer boundary
04 Maintenance & Spares site-specific

Tasks, consumables, and access items are shown only when structured maintenance data is available.

Service Tasks
  • Inspect UV optical path and corrosion-resistant wetted components for acid-gas service
  • Review reference-spectrum compensation when Cl2, SO2, HCl, or HF matrix changes
  • Confirm heated or cool-dry sample conditioning selection before wet-stack duty
Consumables
  • Sample-line filters or conditioning parts when configured extractively
Selection Questions

Frequently Asked Questions

What does this analyzer measure, and how?

This is the gas-phase Cl₂ configuration of GESHINE’s unnumbered UV-DOAS platform. It uses UV-DOAS — UV differential optical absorption spectroscopy — to measure gas-phase Cl₂ absorption with differential spectral processing for continuous process monitoring. Range, accuracy, and response are configured per application (datasheet pending); no numeric ZS model is assigned to this configuration.

How does this analyzer handle corrosive chlorine and acid-gas service?

It uses corrosion-resistant wetted parts, project-configured for chlorine and acid-gas contact (specific materials are datasheet pending). The operating envelope covers Cl₂ and an SO₂/HCl/HF spectral-overlap matrix review; matrices with strong UV-absorbing acid gases should be reviewed before application.

Which gases can interfere with the Cl₂ measurement?

SO2, HCl, and HF spectral overlap can require matrix-specific compensation. Aerosols or condensation in a wet-stack sample path can change the optical basis, and a high SO2, HCl, or HF background should get a UV-DOAS matrix review.

What sample conditioning does this analyzer require?

It runs in an extractive configuration with reference-spectrum compensation and a corrosion-resistant, project-configured wetted path; extractive sample conditioning is selected for wet-stack or acid-gas duty. The compatible conditioning systems are the ZS-SCS-600 Cool-Dry Sampling System and the ZS-SCS-800 High-Temperature Heated Sampling System. Aqueous sample panels are outside this gas-phase analyzer boundary.

Can this analyzer measure chlorine residual in water?

No. This is a gas-phase Cl₂ analyzer. Aqueous free or total chlorine residual measurement is a separate aqueous water-domain path, not this gas analyzer.

What approvals does this analyzer carry?

No certificate list is published for this unnumbered UV-DOAS configuration. Applicable approvals, hazardous-area scope, and any functional-safety rating are project-configured and confirmed against the installation and safety case during engineering review.

Review the UV-DOAS chlorine configuration against site conditions

Send gas range, sample temperature, pressure, moisture, and certification needs before final model selection.